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[1]湛玉龙,付秋明,马志斌*.MPCVD法AlN基体上金刚石薄膜的制备[J].武汉工程大学学报,2011,(01):54-57,61.[doi:10.3969/j.issn.16742869.2011.01.014]
　ZHAN Yu long,FU Qiu ming,MA Zhi bin.Preparation of diamond film on AlN substrate by MPCVD[J].Journal of Wuhan Institute of Technology,2011,(01):54-57,61.[doi:10.3969/j.issn.16742869.2011.01.014]
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《武汉工程大学学报》[ISSN:1674-2869/CN:42-1779/TQ]

卷:
期数:
2011年01期
页码:
54-57,61
栏目:
材料科学与工程
出版日期:
2011-01-30

文章信息/Info

Title:
Preparation of diamond film on AlN substrate by MPCVD
文章编号:
16742869(2011)01005404
作者:
湛玉龙; 付秋明; 马志斌*
武汉工程大学材料科学与工程学院,武汉工程大学湖北省
等离子体化学与新材料重点实验室,湖北 武汉 430074
Author(s):
ZHAN Yulong;  FU Qiuming;  MA Zhibin
School of Material Science and Engineering, Key Laboratory of Plasma Chemical and
Advanced Materials of Hubei Province, Wuhan Institute of Technology, Wuhan 430074, China
关键词:
AlN; 金刚石薄膜; 丙酮; MPCVD
Keywords:
AlN;  diamond film;  acetone;  MPCVD
分类号:
O484.1
DOI:
10.3969/j.issn.16742869.2011.01.014
文献标志码:
A
摘要:
以丙酮和氢气作气源,采用微波等离子体化学气相沉积法(MPCVD)在AlN表面制备金刚石薄膜,并通过拉曼光谱(Raman),扫描电子显微镜(SEM)对沉积得到的金刚石薄膜进行表征.研究表明:直接在AlN表面沉积因金刚石的形核密度很低而很难得到连续的金刚石薄膜.利用金刚石微粉研磨AlN表面有利于金刚石形核密度的提高,Raman分析和电镜观察发现:所得的金刚石薄膜存在杂质和缺陷,没有明显的刻面特征,而且是由粒径较大的球状颗粒堆积而成.
Abstract:
Diamond film was grown on AlN surface using acetone and hydrogen mixture in microwave plasma chemical vapor deposition (MPCVD). The diamond film samples were investigated by Raman spectroscopy analysis (Raman) and Scanning electron microscopy (SEM). The results showed that the continuous diamond film was very difficult to be directly deposited on AlN surface due to low diamond nucleation density. After the diamond nucleation density was improved by using diamond fine powder to grind the AlN surface, the getting diamond film contained nondiamond phase and defects, had no clearly facet features, and was stacked by big size balllike particles from Raman analysis and SEM observation.

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相似文献/References:

[1]谢鹏,汪建华*,王传新,等.热丝CVD法制备金刚石管[J].武汉工程大学学报,2008,(01):73.
　XIE Peng,WANG Jian hua,WANG Chuan xin,et al.The synthesis of diamond tubes by HFCVD[J].Journal of Wuhan Institute of Technology,2008,(01):73.

备注/Memo

备注/Memo:
收稿日期：20100921作者简介：湛玉龙（1988）,男,湖北潜江人,硕士研究生.研究方向：等离子体技术与薄膜材料.指导老师：马志斌,男,博士,教授.研究方向：低温等离子体技术及其应用.
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