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[1]熊礼威,汪建华*,满卫东,等.基片温度对金刚石厚膜生长的影响[J].武汉工程大学学报,2008,(01):83-86.
　XIONG Li wei,WANG Jian hua,MAN Wei dong,et al.Study on the influence of growth temperature on the deposition of diamond thick films by MPCVD[J].Journal of Wuhan Institute of Technology,2008,(01):83-86.
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《武汉工程大学学报》[ISSN:1674-2869/CN:42-1779/TQ]

卷:
期数:
2008年01期
页码:
83-86
栏目:
材料科学与工程
出版日期:
2008-01-30

文章信息/Info

Title:
Study on the influence of growth temperature on the
deposition of diamond thick films by MPCVD
文章编号:
10044736(2008)01008304
作者:
熊礼威; 汪建华*; 满卫东; 曹菊琴; 谢鹏
武汉工程大学湖北省等离子体化学与新材料重点实验室，湖北 武汉 430074
Author(s):
XIONG Liwei;  WANG Jianhua;  MAN Weidong; CAO Juqin; XIE Peng
Key Laboratory of Plasma Chemistry and Advanced Materials of Hubei Province,
Wuhan Institute of Technology, Wuhan 430074,China
关键词:
化学气相沉积; 金刚石厚膜; 微波等离子体
Keywords:
chemical vapor deposition; diamond thick films; microwave plasma
分类号:
O484
DOI:
-
文献标志码:
A
摘要:
采用微波等离子体化学气相沉积（MPCVD）法制备了Φ60 mm的金刚石厚膜，通过对沉积过程和结果的观察发现，由于所用沉积气压较高，基片不同区域温度不均匀，导致不同区域沉积的金刚石厚膜晶型差距较大.通过对不同区域的结果进行比较，发现850 ℃为较好的沉积温度，并在对沉积工艺进行优化后，采用该温度在Φ60 mm的基片上制备了厚度为0.6 mm取向性很好的金刚石厚膜.
Abstract:
Diamond thick film with a diameter of 60 millimeters was deposited by the method of Microwave Plasma Chemical Vapor Deposition (MPCVD). Observation of the growth process and the deposited results showed that the temperature of the substrate was not wellproportioned because of the high pressure, and this resulted in the different surface morphology among the films deposited on different area of the substrate. The comparison among the deposited results of different areas showed that 850℃ was the optimal temperature for the deposition of high quality diamond thick films. The reason of these was analyzed and the deposition technique was optimized based on the discussion. Finally, a highly oriented diamond thick film with a thickness of 0.6 millimeter was deposited by the optimized technique.

参考文献/References:

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备注/Memo

备注/Memo:
收稿日期：20061204
基金项目：湖北省科技攻关计划（2002AA105A02），湖北省高等学校优秀中青年科技创新团队资助计划项目
作者简介：熊礼威（1983），男，湖北仙桃人，硕士研究生.研究方向：低温等离子体技术及其应用. *通讯联系人
汪建华，男，博士，教授，博士生导师.研究方向：低温等离子体与新材料技术.
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