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[1]江川,汪建华,熊礼威,等.基片温度对纳米金刚石薄膜制备的影响[J].武汉工程大学学报,2012,(4):39-42.
　JIANG Chuan,WANG Jian\|hua,XIONG Li\|wei,et al.Influence of substrate temperature on preparation of nano\|crystalline diamond films[J].Journal of Wuhan Institute of Technology,2012,(4):39-42.
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《武汉工程大学学报》[ISSN:1674-2869/CN:42-1779/TQ]

卷:
期数:
2012年4期
页码:
39-42
栏目:
材料科学与工程
出版日期:
2012-05-30

文章信息/Info

Title:
Influence of substrate temperature on preparation
of nano\|crystalline diamond films
文章编号:
16742869(2012)04003904
作者:
江川1; 汪建华1; 2; 熊礼威1; 翁俊1; 2; 苏含1; 刘鹏飞1
1.武汉工程大学湖北省等离子体化学与新材料实验室，湖北 武汉 430074；2.中国科学院等离子体物理研究所，安徽 合肥 230031
Author(s):
JIANG Chuan1;  WANG Jian\|hua1; 2;  XIONG Li\|wei1;  WENG Jun1; 2; SU Han1; LIU Peng\|fei1
1.Key Laboraory of Plasma chemistry and Advanced Materials of Hubei Province, Wuhan Institute of Technology, Wuhan 430074, China;
2. Institute of Plasma Physics Chinese Academy of Sciences, Hefei 230031, China
关键词:
微波等离子体; 化学气相沉积; 纳米金刚石薄膜; 沉积温度
Keywords:
microwave plasma;  chemical vapor deposition;  nano\|crystalline diamond thin film;  deposition temperature
分类号:
O484.1
DOI:
-
文献标志码:
AAdoi:103969/jissn16742869201204010
摘要:
采用多模谐振腔微波等离子体CVD在不同基片温度下制备了纳米金刚石薄膜，通过扫描电子显微镜（SEM）、原子力显微镜（AFM）和拉曼光谱测试，研究了基片温度对纳米金刚石薄膜性能的影响.结果表明：在其他工艺条件不变时，基片温度对薄膜性能具有较大的影响，较低的基片温度更有利于制备高质量的纳米金刚石薄膜，实验所获得的优化基片温度为720 ℃左右.
Abstract:
Using multimode resonant cavity microwave plasma CVD apparatus to prepare nano\|crystalline diamond thin film at different substrate temperatures, we use scanning electron microscope (SEM), atomic force microscope (AFM）and Raman spectroscopy to study the influence of substrate temperature on the properties of nano\|crystalline diamond films. The results show that: with the other conditions unchanged, the substrate temperature has a great influence on the properties of the films, the lower substrate temperature is favorable to deposit nano\|crystalline diamond films with a better quality, the optimized substrate temperature is about 720 ℃.

参考文献/References:

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